SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

The present disclosure provides a semiconductor structure and a method for fabricating a semiconductor structure, wherein the semiconductor structure includes a device layer, including a terminal region and a pixel region adjacent to the terminal region, a conductive pad in the terminal region, and...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TING, SHYH-FANN, HUANG, SHIH-HAN, LIU, JENNG, CHIANG, YEN-TING
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:The present disclosure provides a semiconductor structure and a method for fabricating a semiconductor structure, wherein the semiconductor structure includes a device layer, including a terminal region and a pixel region adjacent to the terminal region, a conductive pad in the terminal region, and an isolation structure in the pixel region, wherein the isolation structure includes a first conductive material.