Method for Providing Different Patterns on a Single Substrate

A method is provided for producing different patterns on a single substrate. The method includes executing at least twice a sequence of the following steps: depositing a hardmask on the layer of interest and patterning the hardmask with a predefined pattern to create an accessible portion on the lay...

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Bibliographische Detailangaben
Hauptverfasser:	Seema Saseendran, Sandeep, Sabuncuoglu Tezcan, Deniz, Paneri, Abhilash, Cummins, Cian
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A method is provided for producing different patterns on a single substrate. The method includes executing at least twice a sequence of the following steps: depositing a hardmask on the layer of interest and patterning the hardmask with a predefined pattern to create an accessible portion on the layer of interest; spinning a glass/carbon layer on the hardmask and on the accessible portion of the layer of interest; spin coating a block copolymer on the glass/carbon layer; transferring a predefined block copolymer pattern onto the layer of interest thereby obtaining a transferred pattern, removing the hard mask; filling the transferred pattern followed by chemical mechanical polishing or etching back, wherein different block copolymer patterns are used.