DETECTION AND LOCATION OF ANOMALOUS PLASMA EVENTS IN FABRICATION CHAMBERS

An apparatus to determine occurrence of an anomalous plasma event occurring at or near a process station of a multi-station integrated circuit fabrication chamber is disclosed. In particular embodiments, optical emissions generated responsive to the anomalous plasma event may be detected by at least...

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Bibliographische Detailangaben
Hauptverfasser: Sakiyama, Yukinori, Baker, Noah Elliot, Rana, Niraj
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An apparatus to determine occurrence of an anomalous plasma event occurring at or near a process station of a multi-station integrated circuit fabrication chamber is disclosed. In particular embodiments, optical emissions generated responsive to the anomalous plasma event may be detected by at least one photosensor of a plurality of photosensors. A processor may cooperate with the plurality of photosensors to determine that the anomalous plasma event has occurred at or near by a particular process station of the multi-station integrated circuit fabrication chamber.