POLISHING PADS WITH INTERCONNECTED PORES
Embodiments herein generally relate to polishing pads and methods of forming polishing pads. A polishing pad includes a plurality of polishing elements and a plurality of grooves disposed between the polishing elements. Each polishing element includes a plurality of individual posts. Each post inclu...
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| creator | WEWALA GONNAGAHADENIYAGE, Shiyan Akalanka Jayanath FUNG, Jason Garcheung KAKIREDDY, Veera Raghava Reddy JAWALI, Puneet Narendra CHOCKALINGAM, Ashwin BARADANAHALLI KENCHAPPA, Nandan BAJAJ, Rajeev |
| description | Embodiments herein generally relate to polishing pads and methods of forming polishing pads. A polishing pad includes a plurality of polishing elements and a plurality of grooves disposed between the polishing elements. Each polishing element includes a plurality of individual posts. Each post includes an individual surface that forms a portion of a polishing surface of the polishing pad and one or more sidewalls extending downwardly from the individual surface. The sidewalls of the plurality of individual posts define a plurality of pores disposed between the posts. |
| format | Patent |
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A polishing pad includes a plurality of polishing elements and a plurality of grooves disposed between the polishing elements. Each polishing element includes a plurality of individual posts. Each post includes an individual surface that forms a portion of a polishing surface of the polishing pad and one or more sidewalls extending downwardly from the individual surface. The sidewalls of the plurality of individual posts define a plurality of pores disposed between the posts.</description><language>eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221215&DB=EPODOC&CC=US&NR=2022395958A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221215&DB=EPODOC&CC=US&NR=2022395958A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WEWALA GONNAGAHADENIYAGE, Shiyan Akalanka Jayanath</creatorcontrib><creatorcontrib>FUNG, Jason Garcheung</creatorcontrib><creatorcontrib>KAKIREDDY, Veera Raghava Reddy</creatorcontrib><creatorcontrib>JAWALI, Puneet Narendra</creatorcontrib><creatorcontrib>CHOCKALINGAM, Ashwin</creatorcontrib><creatorcontrib>BARADANAHALLI KENCHAPPA, Nandan</creatorcontrib><creatorcontrib>BAJAJ, Rajeev</creatorcontrib><title>POLISHING PADS WITH INTERCONNECTED PORES</title><description>Embodiments herein generally relate to polishing pads and methods of forming polishing pads. 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A polishing pad includes a plurality of polishing elements and a plurality of grooves disposed between the polishing elements. Each polishing element includes a plurality of individual posts. Each post includes an individual surface that forms a portion of a polishing surface of the polishing pad and one or more sidewalls extending downwardly from the individual surface. The sidewalls of the plurality of individual posts define a plurality of pores disposed between the posts.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING |
| title | POLISHING PADS WITH INTERCONNECTED PORES |
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