PLANT CULTIVATION APPARATUS AND WATER SUPPLY METHOD THEREFOR
A plant cultivation apparatus may include a cabinet including a cultivation room in which a plurality of beds are accommodated and plants are grown, a residual water detection sensor configured to detect whether residual water of feed water supplied to the plurality of beds is present, a water suppl...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A plant cultivation apparatus may include a cabinet including a cultivation room in which a plurality of beds are accommodated and plants are grown, a residual water detection sensor configured to detect whether residual water of feed water supplied to the plurality of beds is present, a water supply module provided in the cultivation room to supply feed water to the plurality of beds, and a controller configured to perform a water supply process when a specified water supply cycle for the plurality of beds is reached, determine whether water is present in the plurality of beds using the residual water detection sensor when the water supply process is performed, and sequentially perform the water supply operation to one or more beds in which no water is present, among the beds, wherein the water supply operation is an operation of supplying water of a predetermined watering amount to the bed in which no water is present, counting a number of times of water supply for the bed, and waiting for a water supply delay time. |
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