EXHAUSTING DEVICE AND EXHAUSTING METHOD IN SUBSTRATE PROCESSING EQUIPMENT

EXHAUSTING DEVICE AND EXHAUSTING METHOD IN SUBSTRATE PROCESSING EQUIPMENT

The present invention discloses an exhausting device and an exhausting method in substrate processing equipment, and more particularly, a technique for controlling a processing process environment by providing a buffer space for storing chemical fumes outside a ventilation unit of the substrate proc...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KIM, Ki Bong, CHA, Myung Seok, PARK, Jin Se, YOON, Do Hyeon
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:The present invention discloses an exhausting device and an exhausting method in substrate processing equipment, and more particularly, a technique for controlling a processing process environment by providing a buffer space for storing chemical fumes outside a ventilation unit of the substrate processing equipment, and discharging the chemical fumes into the buffer space in accordance with a processing process in a chamber interior space.