APPARATUS FOR TREATING SUBSTRATE

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating container having a treating space; a support unit configured to support and rotate a substrate in the treating space; an exhaust line coupled to the treating container and configured t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	JEONG, Cheol Hwan, KIM, Young Jin, CHOI, Ye Jin, MOON, Jong Won
Format:	Patent
Sprache:	eng
Schlagworte:	CLEANING CLEANING IN GENERAL PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating container having a treating space; a support unit configured to support and rotate a substrate in the treating space; an exhaust line coupled to the treating container and configured to exhaust an airflow within the treating space; a support frame provided independently of a rotation of the support unit and positioned between the treating container and the support unit; and a guide vane protruding to an outside of the support frame and configured to guide the airflow within the treating space in a downward direction.