EXHAUST GAS PURIFICATION DEVICE

The exhaust gas purification device includes a substrate, a first catalyst layer, and a second catalyst layer. The substrate includes an upstream end, a downstream end, and a porous partition wall defining a plurality of cells extending between the upstream end and the downstream end. The plurality...

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Bibliographische Detailangaben
Hauptverfasser:	SUGIURA, Koji, HIRABAYASHI, Takeshi, MURAWAKI, Keisuke, TAKASAKI, Kohei, SATOU, Akemi, OTA, Takaya, IKEBE, Masatoshi, MORISHIMA, Takeshi
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ENGINE PLANTS IN GENERAL GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNALCOMBUSTION ENGINES GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES ORENGINES IN GENERAL HEATING LIGHTING MACHINES OR ENGINES IN GENERAL MECHANICAL ENGINEERING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION STEAM ENGINES THEIR RELEVANT APPARATUS TRANSPORTING WEAPONS
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Beschreibung
Zusammenfassung:	The exhaust gas purification device includes a substrate, a first catalyst layer, and a second catalyst layer. The substrate includes an upstream end, a downstream end, and a porous partition wall defining a plurality of cells extending between the upstream end and the downstream end. The plurality of cells include an inlet cell opening at the upstream end and sealed at the downstream end, and an outlet cell adjacent to the inlet cell sealed at the upstream end and opening at the downstream end. The first catalyst layer is disposed on a surface of the partition wall in an upstream region. In a downstream region, the second catalyst layer is disposed inside the partition wall, and a second catalyst-containing wall including the partition wall and the second catalyst layer has a porosity of 35% or more.