METHOD OF MANUFACTURING COLLECTIVE SUBSTRATE AND COLLECTIVE SUBSTRATE
A method of manufacturing a collective substrate that includes: forming at least one first mark in or on a first main surface of a first substrate; joining the first main surface of the first substrate and a first main surface of a second substrate to each other; forming an opening in the second sub...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A method of manufacturing a collective substrate that includes: forming at least one first mark in or on a first main surface of a first substrate; joining the first main surface of the first substrate and a first main surface of a second substrate to each other; forming an opening in the second substrate such that the first mark is exposed therein; and forming a device portion in or on a second main surface of the second substrate while using the first mark as a reference. |
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