COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL

A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selec...

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Bibliographische Detailangaben
Hauptverfasser:	SMORENBERG, Pieter Gerardus Jacobus, RIJPSTRA, Manouk, ROY, Sarathi, LAMBREGTS, Cornelis Johannes Henricus, KOU, Weitian, GROUWSTRA, Cédric Désiré, TEL, Wim Tjibbo, NIEN, Chi-Fei, CHEN, Chang-Wei
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.