SHOCK WAVE VISUALIZATION FOR EXTREME ULTRAVIOLET PLASMA OPTIMIZATION

SHOCK WAVE VISUALIZATION FOR EXTREME ULTRAVIOLET PLASMA OPTIMIZATION

A method for monitoring a shock wave in an extreme ultraviolet light source includes irradiating a target droplet in the extreme ultraviolet light source apparatus of an extreme ultraviolet lithography tool with ionizing radiation to generate a plasma and to detect a shock wave generated by the plas...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TONG, Yee-Shian Henry, CHANG, Chun-Lin, CHANG, Han-Lung, CHEN, Li-Jui, YEH, Jhan-Hong, SU, Yen-Shuo, CHENG, Ting-Ya, YEH, Jen-Hao, CHENG, Po-Chung
Format: Patent
Sprache:eng
Schlagworte:
DETECTING MASSES OR OBJECTS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GEOPHYSICS
GRAVITATIONAL MEASUREMENTS
MEASURING
PHYSICS
TESTING
X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:A method for monitoring a shock wave in an extreme ultraviolet light source includes irradiating a target droplet in the extreme ultraviolet light source apparatus of an extreme ultraviolet lithography tool with ionizing radiation to generate a plasma and to detect a shock wave generated by the plasma. One or more operating parameters of the extreme ultraviolet light source is adjusted based on the detected shock wave.