PHOTOGRAPHIC SENSOR

A semiconductor substrate includes a matrix of photosites. Each photosite is delimited by an isolation trench including polycrystalline silicon. A peripheral zone extends directly around the matrix of photosites. The peripheral zone includes dummy photosites delimited by isolation trenches including...

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Bibliographische Detailangaben
1. Verfasser: GUYADER, Francois
Format: Patent
Sprache:eng
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Zusammenfassung:A semiconductor substrate includes a matrix of photosites. Each photosite is delimited by an isolation trench including polycrystalline silicon. A peripheral zone extends directly around the matrix of photosites. The peripheral zone includes dummy photosites delimited by isolation trenches including polycrystalline silicon. A density of polycrystalline silicon in the peripheral zone is between a density of polycrystalline silicon at an edge of the matrix of photosites and a density of polycrystalline silicon around the peripheral zone.