CONTROL VALVE, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

There is provided a technique that includes: a gate valve including a movable gate valve plate; and a butterfly valve that is installed at the gate valve plate, has a diameter smaller than those of valve openings configured to be opened or closed by the gate valve plate, and is configured to be capa...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	ONO, Mikio, TANIYAMA, Tomoshi
Format:	Patent
Sprache:	eng
Schlagworte:	ACTUATING-FLOATS BASIC ELECTRIC ELEMENTS BLASTING COCKS DEVICES FOR VENTING OR AERATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES TAPS THERMAL INSULATION IN GENERAL VALVES WEAPONS
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Beschreibung
Zusammenfassung:	There is provided a technique that includes: a gate valve including a movable gate valve plate; and a butterfly valve that is installed at the gate valve plate, has a diameter smaller than those of valve openings configured to be opened or closed by the gate valve plate, and is configured to be capable of being fully closed, wherein the gate valve plate of the gate valve and the butterfly valve are configured to be capable of being driven independently of each other.