CHEMICAL MECHANICAL POLISHING CORRECTION TOOL

A chemical mechanical polishing touch-up tool includes a pedestal configured to support a substrate, a plurality of jaws configured to center the substrate on the pedestal, a loading ring to apply pressure to an annular region on a back side of the substrate on the pedestal, a polishing ring to brin...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Gurusamy, Jay, Zuniga, Steven M
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A chemical mechanical polishing touch-up tool includes a pedestal configured to support a substrate, a plurality of jaws configured to center the substrate on the pedestal, a loading ring to apply pressure to an annular region on a back side of the substrate on the pedestal, a polishing ring to bring a polishing material into contact with an annular region on a front side of the substrate that is aligned with the annular region on the back side of the substrate, and a polishing ring actuator to rotate the polishing ring to cause relative motion between the polishing ring and the substrate.