METHOD AND SYSTEM FOR MANUFACTURING A SEMICONDUCTOR DEVICE

The present disclosure provides a method for manufacturing a semiconductor structure. The method includes receiving layout data representing information for manufacturing the semiconductor structure. A first parasitic capacitance is formed in a first region and a second parasitic capacitance is form...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HUANG, HSUAN-MING, WANG, MING-YIH, CHANG, MINGNI, LU, YINLUNG, TENG, AN SHUN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!