METHOD TO DETECT A DEFECT ON A LITHOGRAPHIC SAMPLE AND METROLOGY SYSTEM TO PERFORM SUCH A METHOD

A method to detect a defect on a lithographic sample includes the following steps: detection light and a detector having at least one sensor pixel are provided. Further, a detection pattern is provided causing a light structure of the detection light being structured at least along one dimension (1D...

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Bibliographische Detailangaben
Hauptverfasser:	Omlor, Lars, Jabbour, Toufic
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTROGRAPHY HOLOGRAPHY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	A method to detect a defect on a lithographic sample includes the following steps: detection light and a detector having at least one sensor pixel are provided. Further, a detection pattern is provided causing a light structure of the detection light being structured at least along one dimension (1D, x). The detection pattern is aligned such that the detector is aligned normal to an extension (xy) of the light structure. Further, a complimentary pattern is provided having a 1D structure which is complimentary to that of the detection pattern. The sample is moved relative to the detection pattern while gathering the detection light on the detector. Further, a reference sample without defects or with negligible defects is provided. The reference sample also is moved relative to the detection pattern while gathering the detection light on the detector. A defect (s1 to s4) localization on the sample is decoded by correlation using the complementary pattern. Using such defect detection method improves a signal-to-noise ratio.