SINGLE-TURN AND LAMINATED-WALL INDUCTIVELY COUPLED PLASMA SOURCES

This disclosure describes systems, methods, and apparatus for making and using a single-turn coil on a remote plasma source to reduce capacitive coupling between the coil and a plasma, and/or a laminated chamber wall including at least one conductive layer that reduces capacitive coupling between th...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Polak, Scott, Madsen, David W, Lee, Yong Jiun, Shabalin, Andrew
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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