INSPECTION DEVICE AND METHOD OF MEASURING WAVEFRONT ABERRATION

An inspection device includes an objective lens that transmits inspection light reflected from a sample during inspection and measurement light from a point light source during aberration measurement, a first pupil relay lens that transmits the inspection light and the measurement light, a second pu...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Ozawa, Ken, KOMATSU, AKIHIRO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An inspection device includes an objective lens that transmits inspection light reflected from a sample during inspection and measurement light from a point light source during aberration measurement, a first pupil relay lens that transmits the inspection light and the measurement light, a second pupil relay lens in which an intermediate imaging plane is formed between the second pupil relay lens and the first pupil relay lens, a diffraction grating disposed between the first pupil relay lens and the intermediate imaging plane and that diffracts the measurement light, a point diffraction interferometry plate disposed within a depth of focus of the intermediate imaging plane and that selectively transmits the diffracted light, a first detector that detects an image of the sample, and a second detector that detects a fringe image of the measurement light.