FIELD PLATE STRUCTURE FOR HIGH VOLTAGE DEVICE

Various embodiments of the present disclosure are directed towards an integrated chip comprising a gate electrode disposed on a substrate between a pair of source/drain regions. A dielectric layer is over the substrate. A field plate is disposed on the dielectric layer and laterally between the gate...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Lu, Hui-Ting, Ho, Chia-Cheng, Jong, Yu-Chang, Wang, Pei-Lun, Jhou, Jyun-Guan
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Various embodiments of the present disclosure are directed towards an integrated chip comprising a gate electrode disposed on a substrate between a pair of source/drain regions. A dielectric layer is over the substrate. A field plate is disposed on the dielectric layer and laterally between the gate electrode and a first source/drain region in the pair of source/drain regions. The field plate comprises a first field plate layer and a second field plate layer. The second field plate layer extends along sidewalls and a bottom surface of the first field plate layer. The first and second field plate layers comprise a conductive material.