Low Inclusion TiO2-SiO2 Glass Obtained by Hot Isostatic Pressing

A silica-titania glass substrate comprising: (i) a composition comprising 5 weight percent to 10 weight percent TiO2; (ii) a coefficient of thermal expansion (CTE) at 20° C. in a range from −45 ppb/K to +20 ppb/K; (iii) a crossover temperature (Tzc) in a range from 10° C. to 50° C.; (iv) a slope of...

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Bibliographische Detailangaben
Hauptverfasser:	Campion, Michael John, Hrdina, Kenneth Edward, Maxon, John Edward
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
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Beschreibung
Zusammenfassung:	A silica-titania glass substrate comprising: (i) a composition comprising 5 weight percent to 10 weight percent TiO2; (ii) a coefficient of thermal expansion (CTE) at 20° C. in a range from −45 ppb/K to +20 ppb/K; (iii) a crossover temperature (Tzc) in a range from 10° C. to 50° C.; (iv) a slope of CTE at 20° C. in a range from 1.20 ppb/K2 to 1.75 ppb/K2; (v) a refractive index variation of less than 140 ppm; and (vi) 600 ppm OH group concentration or greater. The substrate can have a mass of 1 kg or greater and less than 0.05 gas inclusions per cubic inch via a method comprising (i) forming the substrate from soot particles comprising SiO2 and TiO2, and (ii) subjecting the substrate to an environment having an elevated temperature and an elevated pressure for a period of time until the substrate comprises less than 0.05 gas inclusions per cubic inch.