X-RAY ANALYSIS APPARATUS

Provided is an X-ray analysis apparatus including: a goniometer; a sample stage provided at a rotation center of the goniometer; an X-ray source configured to irradiate a sample with an X-ray, the sample being fixed on the sample stage; an X-ray detector configured to detect the X-ray diffracted by...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	OSAKABE, Takeshi
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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Beschreibung
Zusammenfassung:	Provided is an X-ray analysis apparatus including: a goniometer; a sample stage provided at a rotation center of the goniometer; an X-ray source configured to irradiate a sample with an X-ray, the sample being fixed on the sample stage; an X-ray detector configured to detect the X-ray diffracted by the sample; and an opening/closing mechanism configured to vary a width of a slit, which is formed between a pair of shielding members, by opening/closing the pair of shielding members, the opening/closing mechanism including an asymmetric control unit configured to control aperture widths of the pair of shielding members asymmetrically for one of the pair of shielding members on one side and another one of the pair of shielding members on another side depending on a rotation angle of the goniometer.