METHOD FOR SEPARATING A PLURALITY OF SLICES FROM WORKPIECES DURING A NUMBER OF SEPARATING PROCESSES BY MEANS OF A WIRE SAW, AND SEMICONDUCTOR WAFER MADE OF MONOCRYSTALLINE SILICON

Wafer shape parameters from prior runs of simultaneously slicing a plurality of wafers from a workpiece in a wire saw having a sawing wire tensioned between wire guide rolls are used to alter the temperature profile of fixed and a moveable bearings at the ends of at least one wire guide roll, result...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WIESNER, Peter, PIETSCH, Georg
Format: Patent
Sprache:eng
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Zusammenfassung:Wafer shape parameters from prior runs of simultaneously slicing a plurality of wafers from a workpiece in a wire saw having a sawing wire tensioned between wire guide rolls are used to alter the temperature profile of fixed and a moveable bearings at the ends of at least one wire guide roll, resulting in wafers with low waviness.