TRANSPARENT GAS BARRIER FILM AND METHOD FOR PRODUCING SAME

An object of the present invention is to provide a transparent barrier film that has excellent acid resistance and is inexpensive, and a method for producing the same. A transparent gas barrier film includes a plastic film and an aluminum oxide layer provided on at least one surface of the plastic f...

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Bibliographische Detailangaben
Hauptverfasser:	IWATA, Daisuke, ISEKI, Kiyoshi
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	An object of the present invention is to provide a transparent barrier film that has excellent acid resistance and is inexpensive, and a method for producing the same. A transparent gas barrier film includes a plastic film and an aluminum oxide layer provided on at least one surface of the plastic film, the aluminum oxide layer mainly composed of aluminum oxide. The absorption coefficient of the inorganic oxide layer immediately after vapor-deposition is less than 0.03 nm−1, and the film thickness of the inorganic oxide layer is 6 nm or more and 10 nm or less.