PHOTOMASK

PHOTOMASK

A photomask excellent in durability and exposure efficiency is provided, which is obtained by a simple manufacturing method at a low cost, exhibits sufficient ESD-suppressing effect, causes no destruction of an exposure pattern, and has satisfactory exposure efficiency. The photomask comprises a lig...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Katayama, Yoshinori, Echigoya, Takahiro, Sasaki, Masaharu, Ikeda, Shinobu
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:A photomask excellent in durability and exposure efficiency is provided, which is obtained by a simple manufacturing method at a low cost, exhibits sufficient ESD-suppressing effect, causes no destruction of an exposure pattern, and has satisfactory exposure efficiency. The photomask comprises a light-shielding film formed into a pattern for shielding a photoresist film from exposure to light, formed on a surface of a transparent substrate. A coating layer including a thiophene-based conductive resin is formed on the transparent substrate having the light-shielding film formed thereon. The sheet resistance at a surface of the photomask having the coating layer including a thiophene-based conductive resin is smaller than 1011Ω/□.