APPARATUS FOR SUPPLYING LIQUID, CLEANING UNIT, AND APPARATUS FOR PROCESSING SUBSTRATE

There is provided an apparatus for supplying liquid, comprising a flow controller configured to measure a flow rate of a liquid and control the flow rate based on a measurement value; a first valve connected with the flow controller to control supply of a first liquid to the flow controller; a secon...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Toyomasu, Fujihiko, Kunisawa, Junji
Format:	Patent
Sprache:	eng
Schlagworte:	CLEANING CLEANING IN GENERAL CONTROLLING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS PHYSICS POLISHING PREVENTION OF FOULING IN GENERAL REGULATING SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES TRANSPORTING
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