APPARATUS FOR SUPPLYING LIQUID, CLEANING UNIT, AND APPARATUS FOR PROCESSING SUBSTRATE

There is provided an apparatus for supplying liquid, comprising a flow controller configured to measure a flow rate of a liquid and control the flow rate based on a measurement value; a first valve connected with the flow controller to control supply of a first liquid to the flow controller; a secon...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Toyomasu, Fujihiko, Kunisawa, Junji
Format:	Patent
Sprache:	eng
Schlagworte:	CLEANING CLEANING IN GENERAL CONTROLLING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS PHYSICS POLISHING PREVENTION OF FOULING IN GENERAL REGULATING SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES TRANSPORTING
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Beschreibung
Zusammenfassung:	There is provided an apparatus for supplying liquid, comprising a flow controller configured to measure a flow rate of a liquid and control the flow rate based on a measurement value; a first valve connected with the flow controller to control supply of a first liquid to the flow controller; a second valve connected with the flow controller to control supply of a second liquid to the flow controller; and a control device configured to control the first valve and the second valve, wherein the control device switches over the first valve and the second valve with providing a delay time between an open/closed switchover time of the first valve and an open/closed switchover time of the second valve.