RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

A resist composition that contains a resin component having a constitutional unit represented by General Formula (a0-1) and contains a photodecomposable base in which an acid dissociation constant of a conjugate acid is 4.0 or less, wherein R01 represents a hydrogen atom or an alkyl group having 1 t...

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Bibliographische Detailangaben
Hauptverfasser:	YAHAGI, Masahito, KOJIMA, Takahiro, ODASHIMA, Rin
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	A resist composition that contains a resin component having a constitutional unit represented by General Formula (a0-1) and contains a photodecomposable base in which an acid dissociation constant of a conjugate acid is 4.0 or less, wherein R01 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms; Ya01 represents a single bond or a divalent linking group; Ra01 represents a hydrocarbon group; Ya02 represents a single bond or a divalent linking group; Ra02 represents a hydrogen atom, a hydroxy group, or a hydrocarbon group; Ar represents a benzene ring or a naphthalene ring; Ra01 and Ra02 may be bonded to each other to form a ring; n01 represents an integer in a range of 1 to 6