PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF PREPARING THE PHOTOACID GENERATOR

Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

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Bibliographische Detailangaben
Hauptverfasser:	HONG, Sukkoo, SONG, Giyoung, PARK, Juhyeon, KWAK, Yoonhyun, LEE, Eunkyung, NAM, Youngmin, KIM, Hyunwoo, CHOI, Sungwon, LEE, Sunyoung, KIM, Sumin, SOHN, Byunghee, JEON, Aram
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.