SLURRY-BASED METHODS FOR ENVIRONMENTAL BARRIER COATING REPAIR AND ARTICLES FORMED BY THE METHODS
Methods for forming a sintered patch on a silicon-based substrate are disclosed. The methods include applying a patch slurry on the silicon-based substrate, drying the patch slurry on the silicon-based substrate to form a dried patch material, and sintering the dried patch material in an oxidizing a...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Methods for forming a sintered patch on a silicon-based substrate are disclosed. The methods include applying a patch slurry on the silicon-based substrate, drying the patch slurry on the silicon-based substrate to form a dried patch material, and sintering the dried patch material in an oxidizing atmosphere to form a sintered patch on the silicon-based substrate. The patch slurry includes a patch material containing silicates in a fluid carrier. |
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