SLURRY-BASED METHODS FOR ENVIRONMENTAL BARRIER COATING REPAIR AND ARTICLES FORMED BY THE METHODS

Methods for forming a sintered patch on a silicon-based substrate are disclosed. The methods include applying a patch slurry on the silicon-based substrate, drying the patch slurry on the silicon-based substrate to form a dried patch material, and sintering the dried patch material in an oxidizing a...

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Bibliographische Detailangaben
Hauptverfasser: Lipkin, Don Mark, Antolino, Nicholas Edward, Saha, Atanu, Nagesh, Mamatha, Satya Kishore, Manepalli
Format: Patent
Sprache:eng
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Zusammenfassung:Methods for forming a sintered patch on a silicon-based substrate are disclosed. The methods include applying a patch slurry on the silicon-based substrate, drying the patch slurry on the silicon-based substrate to form a dried patch material, and sintering the dried patch material in an oxidizing atmosphere to form a sintered patch on the silicon-based substrate. The patch slurry includes a patch material containing silicates in a fluid carrier.