APPARATUS AND METHOD FABRICATING SEMICONDUCTOR DEVICE

A method of fabricating a semiconductor device include; seating a substrate having a substrate radius on an electrostatic chuck, applying first radio-frequency power to the electrostatic chuck to induce plasma in a region at least above the electrostatic chuck, and generating a magnetic field in the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SHIM, SEUNGBO, LIM, SUNGYONG, CHO, CHUNGHO, KIM, NAM KYUN, KIM, MINJOON, BANG, JIN YOUNG, LEE, BONGJU, LEE, JINSEOK, KWON, DEOKJIN, CHO, SUNGIL, SHIN, TAE-SUN, NA, DONGHYEON
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A method of fabricating a semiconductor device include; seating a substrate having a substrate radius on an electrostatic chuck, applying first radio-frequency power to the electrostatic chuck to induce plasma in a region at least above the electrostatic chuck, and generating a magnetic field in the region at least above the electrostatic chuck using a magnet having a ring-shape and disposed above the electrostatic chuck by applying second radio-frequency power to the magnet, wherein the magnet has an inner radius ranging from about one-half to about one-fourth of the substrate radius.