TRANSISTOR AND METHODS OF FABRICATING A TRANSISTOR

A transistor may include a buffer layer, source and drain contacts on the buffer layer, a barrier layer on the buffer layer, a conductive member on the barrier layer, a dielectric stack, and a gate metal. The barrier layer may be between the source and drain contacts. The conductive member may include a p-doped III-V compound. The dielectric stack may be on the barrier layer and on the conductive member. The dielectric stack may include a first dielectric layer and a second dielectric layer on the first dielectric layer. First and second trenches may extend through the dielectric stack to the conductive member and to the first dielectric layer, respectively. The gate metal may be on the dielectric stack, and may contact the conductive member through the first trench and may contact the first dielectric layer through the second trench.