RING FOR SUBSTRATE EXTREME EDGE PROTECTION

Embodiments of the present disclosure provide a method and an apparatus for processing a substrate. The apparatus has a ring assembly. The ring assembly has an edge ring and a shadow ring. The edge ring has a ring shaped body. The edge ring body has a top surface and a bottom surface. Pin holes exte...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MATHEW, Grace, WILLWERTH, Michael D, MITHUN, Aditi, KUMAR, Prabhat, SCHMID, Andreas, SCHWARZ, Benjamin
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Embodiments of the present disclosure provide a method and an apparatus for processing a substrate. The apparatus has a ring assembly. The ring assembly has an edge ring and a shadow ring. The edge ring has a ring shaped body. The edge ring body has a top surface and a bottom surface. Pin holes extend through the edge ring body from the top surface to the bottom surface. The shadow ring has a ring shaped body. The shadow ring body has an upper surface and a lower surface. Sockets are formed on the lower surface, wherein the sockets in the shadow ring body align with the pin holes in the edge ring body.