POD CLEANING PROCESS

Proposed is a POD cleaning process including: separating an introduced POD into an inner POD and an outer POD; cleaning a separation POD, which results from the separation, within a cleaning sub-chamber; drying the separation POD, which undergoes the cleaning, within a drying chamber; vacuum-process...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	HUR, Dong Geun, PARK, Young Soo, LEE, Ki Man
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BLASTING CINEMATOGRAPHY CLEANING CLEANING IN GENERAL DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTROGRAPHY HEATING HOLOGRAPHY LIGHTING MATERIALS THEREFOR MECHANICAL ENGINEERING ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREVENTION OF FOULING IN GENERAL TRANSPORTING WEAPONS
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Beschreibung
Zusammenfassung:	Proposed is a POD cleaning process including: separating an introduced POD into an inner POD and an outer POD; cleaning a separation POD, which results from the separation, within a cleaning sub-chamber; drying the separation POD, which undergoes the cleaning, within a drying chamber; vacuum-processing the separation POD undergoing the drying; and assembling the inner POD and the outer POD that undergo the vacuum processing, in which the cleaning and the drying are separately performed.