SUBSTRATE PROCESSING APPARATUS

A chamber is provided where an exhaust port for exhausting a gas in an inside thereof is formed thereon and substrate processing for a substrate is executed in the inside. A partition member partitions the inside of the chamber into a processing region where the substrate processing is executed and an exhaust region that leads to the exhaust port. The partition member is configured to include a plurality of plate-shaped members. The plurality of plate-shaped members are provided in such a manner that at least a part of each thereof is arranged obliquely at intervals in a side view from a side of a side surface of the chamber and an upper end part of each thereof is arranged so as to overlap with a lower end part of the plate-shaped member that is adjacent thereto in a top view from an upper side of the chamber.