DEVELOPING METHOD AND APPARATUS

A developing method and apparatus are provided. The developing method includes: obtaining airflow conditions above a wafer to be developed; setting a developing procedure according to the airflow conditions; and developing the wafer to be developed according to the developing procedure.

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Bibliographische Detailangaben
Hauptverfasser:	SUN, Helei, CHEN, Buxiang
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A developing method and apparatus are provided. The developing method includes: obtaining airflow conditions above a wafer to be developed; setting a developing procedure according to the airflow conditions; and developing the wafer to be developed according to the developing procedure.