FRACTIONING DEVICE

A fractioning device for an ion implantation device with at least one fractioning wall, wherein the fractioning device is suitable for being inserted within a channel. The channel is configured to connect an ion source, which is at a first pressure p1 and a processing chamber, which is at a second p...

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Bibliographische Detailangaben
Hauptverfasser:	ROQUINY, Philippe, JACQUES, Amory, FERNANDES, José, RIVOLTA, Nicolas, NAVET, Benjamine
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A fractioning device for an ion implantation device with at least one fractioning wall, wherein the fractioning device is suitable for being inserted within a channel. The channel is configured to connect an ion source, which is at a first pressure p1 and a processing chamber, which is at a second pressure p2 in an ion implantation device.