COMPOUND AND COMPOSITION
The present invention provides: a compound that has a low melting point and is capable of forming a film of high hydrophobicity, and a composition containing this compound. The compound of the present invention is represented by chemical formula (1).(In the formula, R1 and R2 are each a C1-C33 aliph...
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| creator | ARATA, Ryuya KAMENOUE, Shogo MIZOOKU, Takashi KIMURA, Akiyoshi |
| description | The present invention provides: a compound that has a low melting point and is capable of forming a film of high hydrophobicity, and a composition containing this compound. The compound of the present invention is represented by chemical formula (1).(In the formula, R1 and R2 are each a C1-C33 aliphatic hydrocarbon group, the total number of carbons of in R1 and R2 is 14-34, X is a single bond or a C1-C5 aliphatic hydrocarbon group, and A is -O-CH2-CH(OH)-CH2OH or -O-CH(-CH2-OH)2.) |
| format | Patent |
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The compound of the present invention is represented by chemical formula (1).(In the formula, R1 and R2 are each a C1-C33 aliphatic hydrocarbon group, the total number of carbons of in R1 and R2 is 14-34, X is a single bond or a C1-C5 aliphatic hydrocarbon group, and A is -O-CH2-CH(OH)-CH2OH or -O-CH(-CH2-OH)2.)</description><language>eng</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; ADHESIVES ; CHEMISTRY ; DYES ; HETEROCYCLIC COMPOUNDS ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC CHEMISTRY ; PAINTS ; POLISHES</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220512&DB=EPODOC&CC=US&NR=2022144741A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220512&DB=EPODOC&CC=US&NR=2022144741A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ARATA, Ryuya</creatorcontrib><creatorcontrib>KAMENOUE, Shogo</creatorcontrib><creatorcontrib>MIZOOKU, Takashi</creatorcontrib><creatorcontrib>KIMURA, Akiyoshi</creatorcontrib><title>COMPOUND AND COMPOSITION</title><description>The present invention provides: a compound that has a low melting point and is capable of forming a film of high hydrophobicity, and a composition containing this compound. 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The compound of the present invention is represented by chemical formula (1).(In the formula, R1 and R2 are each a C1-C33 aliphatic hydrocarbon group, the total number of carbons of in R1 and R2 is 14-34, X is a single bond or a C1-C5 aliphatic hydrocarbon group, and A is -O-CH2-CH(OH)-CH2OH or -O-CH(-CH2-OH)2.)</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACYCLIC OR CARBOCYCLIC COMPOUNDS ADHESIVES CHEMISTRY DYES HETEROCYCLIC COMPOUNDS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY PAINTS POLISHES |
| title | COMPOUND AND COMPOSITION |
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