COMPOUND AND COMPOSITION

The present invention provides: a compound that has a low melting point and is capable of forming a film of high hydrophobicity, and a composition containing this compound. The compound of the present invention is represented by chemical formula (1).(In the formula, R1 and R2 are each a C1-C33 aliph...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	ARATA, Ryuya, KAMENOUE, Shogo, MIZOOKU, Takashi, KIMURA, Akiyoshi
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS ADHESIVES CHEMISTRY DYES HETEROCYCLIC COMPOUNDS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY PAINTS POLISHES
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Beschreibung
Zusammenfassung:	The present invention provides: a compound that has a low melting point and is capable of forming a film of high hydrophobicity, and a composition containing this compound. The compound of the present invention is represented by chemical formula (1).(In the formula, R1 and R2 are each a C1-C33 aliphatic hydrocarbon group, the total number of carbons of in R1 and R2 is 14-34, X is a single bond or a C1-C5 aliphatic hydrocarbon group, and A is -O-CH2-CH(OH)-CH2OH or -O-CH(-CH2-OH)2.)