MULTI COLOR STACK FOR SELF ALIGNED DUAL PATTERN FORMATION FOR MULTI PURPOSE DEVICE STRUCTURES

A substrate processing method includes creating a mask on a top surface of a workpiece. A first portion of a gap fill material is overlaid by the mask and a second portion of the gap fill material is exposed through an opening in the mask. The method further includes exposing the workpiece to a plas...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PARIKH, Suketu Arun, SEAMONS, Martin Jay, CHOI, Tom, OJHA, Shuchi Sunil, INGLE, Nitin K, LIANG, Jingmei, NATARAJAN, Sanjay
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!