MULTI COLOR STACK FOR SELF ALIGNED DUAL PATTERN FORMATION FOR MULTI PURPOSE DEVICE STRUCTURES

MULTI COLOR STACK FOR SELF ALIGNED DUAL PATTERN FORMATION FOR MULTI PURPOSE DEVICE STRUCTURES

A substrate processing method includes creating a mask on a top surface of a workpiece. A first portion of a gap fill material is overlaid by the mask and a second portion of the gap fill material is exposed through an opening in the mask. The method further includes exposing the workpiece to a plas...

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Bibliographische Detailangaben
Hauptverfasser: PARIKH, Suketu Arun, SEAMONS, Martin Jay, CHOI, Tom, OJHA, Shuchi Sunil, INGLE, Nitin K, LIANG, Jingmei, NATARAJAN, Sanjay
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A substrate processing method includes creating a mask on a top surface of a workpiece. A first portion of a gap fill material is overlaid by the mask and a second portion of the gap fill material is exposed through an opening in the mask. The method further includes exposing the workpiece to a plasma. The method further includes performing a first etching of the first portion of the gap fill material to create a first cavity while the second portion of the gap fill material remains in place, depositing a first metal-containing substance in the first cavity, performing a second etching of the second portion of the gap fill material to create a second cavity while the first metal-containing substance remains in place, and depositing a second metal-containing substance in the second cavity.