METHOD OF TRAINING DEEP LEARNING MODEL FOR PREDICTING PATTERN CHARACTERISTICS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
A method of manufacturing a semiconductor device includes forming a pattern on a wafer, measuring a spectrum of the pattern on the wafer, with a spectral optical system, performing an analysis of the spectrum through a deep learning model for predicting pattern characteristics, the deep learning mod...
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| creator | YUN, Kyungwon BYOUN, Seunggun BAE, Yoonsung GWAK, Seungho JO, Taeyong KIM, Kwangrak SHIN, Younghoon LEE, Chiyoung SONG, Gilwoo |
| description | A method of manufacturing a semiconductor device includes forming a pattern on a wafer, measuring a spectrum of the pattern on the wafer, with a spectral optical system, performing an analysis of the spectrum through a deep learning model for predicting pattern characteristics, the deep learning model being trained based on a domain knowledge, and evaluating the pattern on the wafer based on the analysis of the spectrum, wherein the domain knowledge includes a noise inducing factor of the spectral optical system. |
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| subjects | BASIC ELECTRIC ELEMENTS CALCULATING COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS COMPUTING COUNTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PHYSICS SEMICONDUCTOR DEVICES |
| title | METHOD OF TRAINING DEEP LEARNING MODEL FOR PREDICTING PATTERN CHARACTERISTICS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
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