METHOD OF TRAINING DEEP LEARNING MODEL FOR PREDICTING PATTERN CHARACTERISTICS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

A method of manufacturing a semiconductor device includes forming a pattern on a wafer, measuring a spectrum of the pattern on the wafer, with a spectral optical system, performing an analysis of the spectrum through a deep learning model for predicting pattern characteristics, the deep learning mod...

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Bibliographische Detailangaben
Hauptverfasser: YUN, Kyungwon, BYOUN, Seunggun, BAE, Yoonsung, GWAK, Seungho, JO, Taeyong, KIM, Kwangrak, SHIN, Younghoon, LEE, Chiyoung, SONG, Gilwoo
Format: Patent
Sprache:eng
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Zusammenfassung:A method of manufacturing a semiconductor device includes forming a pattern on a wafer, measuring a spectrum of the pattern on the wafer, with a spectral optical system, performing an analysis of the spectrum through a deep learning model for predicting pattern characteristics, the deep learning model being trained based on a domain knowledge, and evaluating the pattern on the wafer based on the analysis of the spectrum, wherein the domain knowledge includes a noise inducing factor of the spectral optical system.