A METHOD FOR CHARACTERIZING A MANUFACTURING PROCESS OF SEMICONDUCTOR DEVICES

A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimens...

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Bibliographische Detailangaben
Hauptverfasser: MASLOW, Mark John, HUIJGEN, Ralph Timotheus, DILLEN, Hermanus Adrianus, THUIJS, Koen, MULKENS, Johannes Catharinus Hubertus, SLOTBOOM, Daan Maurits, ENGBLOM, Peter David, TEL, Wim Tjibbo, KEA, Marc Jurian
Format: Patent
Sprache:eng
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Zusammenfassung:A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.