METHOD FOR MANUFACTURING DEPOSITION MASK

A method for manufacturing a deposition mask having a plurality of openings arranged in a matrix pattern in an active region formation portion of a mask base, which is fixed to a frame while being tensioned, the method including: a step A of preparing a mask base of an initial state fixed to a frame...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KISHIMOTO, KATSUHIKO, SAKIO, SUSUMU
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING CHEMICAL SURFACE TREATMENT CHEMISTRY CLADDING OR PLATING BY SOLDERING OR WELDING COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPUTING COUNTING CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DIGITAL DATA PROCESSING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR METALLURGY PERFORMING OPERATIONS PHYSICS SOLDERING OR UNSOLDERING SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING WELDING WORKING BY LASER BEAM
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Beschreibung
Zusammenfassung:	A method for manufacturing a deposition mask having a plurality of openings arranged in a matrix pattern in an active region formation portion of a mask base, which is fixed to a frame while being tensioned, the method including: a step A of preparing a mask base of an initial state fixed to a frame while being tensioned in a predetermined condition so as to define an xy plane; a step B of preparing target coordinate data that identifies a position of each of the plurality of openings in the xy plane; a step C of predicting, for each of the plurality of openings, an amount of displacement from the target coordinate data caused by the formation of the openings to generate such correction data that reduces the amount of displacement; and a step D of forming each of the plurality of openings at a position that is identified based on the target coordinate data and the correction data, wherein: in the step C, the correction data for each of the plurality of openings is associated with an order in which the plurality of openings are formed; and in the step D, the plurality of openings are formed in the order.