METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respecti...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Den Boef, Arie Jeffrey, TSIATMAS, Anagnostis, Theeuwes, Thomas, Hinnen, Paul Christiaan, Mc Namara, Elliott Gerard, De La Fuente Valentin, Maria Isabel, Shahrjerdy, Mir Homayoun, Wang, Shu-jin
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTROGRAPHY HOLOGRAPHY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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