RF TREATMENT SYSTEMS AND METHODS

Methods and systems are provided for, applying RF power as part of an RF treatment. The RF power may be applied until a first target temperature is reached, wherein the first target temperature is less than a final target temperature. Responsive to the reaching the first target temperature, applicat...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Yaghmaee, Parastoo, Kabir, Zakiul, Chun, Hon Ming, Smalley, Nathanial G
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Yaghmaee, Parastoo
Kabir, Zakiul
Chun, Hon Ming
Smalley, Nathanial G
description Methods and systems are provided for, applying RF power as part of an RF treatment. The RF power may be applied until a first target temperature is reached, wherein the first target temperature is less than a final target temperature. Responsive to the reaching the first target temperature, application of the RF power may be varied via a feedback control loop until final target temperature is achieved. The application of the RF power may be paused responsive to determining that a temperature spread is greater than a threshold.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2022061134A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2022061134A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2022061134A13</originalsourceid><addsrcrecordid>eNrjZFAIclMICXJ1DPF19QtRCI4MDnH1DVZw9HNR8HUN8fB3CeZhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGRkYGZoaGxiaOhsbEqQIAgiQi0A</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>RF TREATMENT SYSTEMS AND METHODS</title><source>esp@cenet</source><creator>Yaghmaee, Parastoo ; Kabir, Zakiul ; Chun, Hon Ming ; Smalley, Nathanial G</creator><creatorcontrib>Yaghmaee, Parastoo ; Kabir, Zakiul ; Chun, Hon Ming ; Smalley, Nathanial G</creatorcontrib><description>Methods and systems are provided for, applying RF power as part of an RF treatment. The RF power may be applied until a first target temperature is reached, wherein the first target temperature is less than a final target temperature. Responsive to the reaching the first target temperature, application of the RF power may be varied via a feedback control loop until final target temperature is achieved. The application of the RF power may be paused responsive to determining that a temperature spread is greater than a threshold.</description><language>eng</language><subject>ELECTRIC HEATING ; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220224&amp;DB=EPODOC&amp;CC=US&amp;NR=2022061134A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220224&amp;DB=EPODOC&amp;CC=US&amp;NR=2022061134A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Yaghmaee, Parastoo</creatorcontrib><creatorcontrib>Kabir, Zakiul</creatorcontrib><creatorcontrib>Chun, Hon Ming</creatorcontrib><creatorcontrib>Smalley, Nathanial G</creatorcontrib><title>RF TREATMENT SYSTEMS AND METHODS</title><description>Methods and systems are provided for, applying RF power as part of an RF treatment. The RF power may be applied until a first target temperature is reached, wherein the first target temperature is less than a final target temperature. Responsive to the reaching the first target temperature, application of the RF power may be varied via a feedback control loop until final target temperature is achieved. The application of the RF power may be paused responsive to determining that a temperature spread is greater than a threshold.</description><subject>ELECTRIC HEATING</subject><subject>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAIclMICXJ1DPF19QtRCI4MDnH1DVZw9HNR8HUN8fB3CeZhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGRkYGZoaGxiaOhsbEqQIAgiQi0A</recordid><startdate>20220224</startdate><enddate>20220224</enddate><creator>Yaghmaee, Parastoo</creator><creator>Kabir, Zakiul</creator><creator>Chun, Hon Ming</creator><creator>Smalley, Nathanial G</creator><scope>EVB</scope></search><sort><creationdate>20220224</creationdate><title>RF TREATMENT SYSTEMS AND METHODS</title><author>Yaghmaee, Parastoo ; Kabir, Zakiul ; Chun, Hon Ming ; Smalley, Nathanial G</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2022061134A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2022</creationdate><topic>ELECTRIC HEATING</topic><topic>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>Yaghmaee, Parastoo</creatorcontrib><creatorcontrib>Kabir, Zakiul</creatorcontrib><creatorcontrib>Chun, Hon Ming</creatorcontrib><creatorcontrib>Smalley, Nathanial G</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Yaghmaee, Parastoo</au><au>Kabir, Zakiul</au><au>Chun, Hon Ming</au><au>Smalley, Nathanial G</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>RF TREATMENT SYSTEMS AND METHODS</title><date>2022-02-24</date><risdate>2022</risdate><abstract>Methods and systems are provided for, applying RF power as part of an RF treatment. The RF power may be applied until a first target temperature is reached, wherein the first target temperature is less than a final target temperature. Responsive to the reaching the first target temperature, application of the RF power may be varied via a feedback control loop until final target temperature is achieved. The application of the RF power may be paused responsive to determining that a temperature spread is greater than a threshold.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US2022061134A1
source esp@cenet
subjects ELECTRIC HEATING
ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
title RF TREATMENT SYSTEMS AND METHODS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T09%3A13%3A31IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Yaghmaee,%20Parastoo&rft.date=2022-02-24&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2022061134A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true