RF TREATMENT SYSTEMS AND METHODS

RF TREATMENT SYSTEMS AND METHODS

Methods and systems are provided for, applying RF power as part of an RF treatment. The RF power may be applied until a first target temperature is reached, wherein the first target temperature is less than a final target temperature. Responsive to the reaching the first target temperature, applicat...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Yaghmaee, Parastoo, Kabir, Zakiul, Chun, Hon Ming, Smalley, Nathanial G
Format: Patent
Sprache:eng
Schlagworte:
ELECTRIC HEATING
ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Methods and systems are provided for, applying RF power as part of an RF treatment. The RF power may be applied until a first target temperature is reached, wherein the first target temperature is less than a final target temperature. Responsive to the reaching the first target temperature, application of the RF power may be varied via a feedback control loop until final target temperature is achieved. The application of the RF power may be paused responsive to determining that a temperature spread is greater than a threshold.