SUPPORT UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

A support unit for supporting a substrate includes a heating member and a reflector, and the reflector includes a curved surface that reflects thermal energy generated by the heating member toward an edge region of the substrate.

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Bibliographische Detailangaben
Hauptverfasser: YUN, Kangseop, LEE, Youngil, CHOI, Jungbong
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A support unit for supporting a substrate includes a heating member and a reflector, and the reflector includes a curved surface that reflects thermal energy generated by the heating member toward an edge region of the substrate.