METHOD AND DEVICE FOR PLATING A RECESS IN A SUBSTRATE
The teaching relates to a method for plating a recess in a substrate, a device for plating a recess in a substrate and a system for plating a recess in a substrate comprising the device. The method for plating a recess in a substrate includes the following:a) Providing a substrate with a substrate s...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | The teaching relates to a method for plating a recess in a substrate, a device for plating a recess in a substrate and a system for plating a recess in a substrate comprising the device. The method for plating a recess in a substrate includes the following:a) Providing a substrate with a substrate surface comprising at least one recess,b) applying a replacement gas to the recess to replace an amount of ambient gas in the recess to at least partially clear the recess from the ambient gas,c) applying a processing fluid to the recess, wherein the replacement gas dissolves in the processing fluid to at least partially clear the recess from the replacement gas, andd) plating the recess. |
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