METHOD AND DEVICE FOR PLATING A RECESS IN A SUBSTRATE

The teaching relates to a method for plating a recess in a substrate, a device for plating a recess in a substrate and a system for plating a recess in a substrate comprising the device. The method for plating a recess in a substrate includes the following:a) Providing a substrate with a substrate s...

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Bibliographische Detailangaben
Hauptverfasser: Gleissner, Andreas, Markut, Franz, Engesser, Philipp, Okom-Schmidt, Harald, Wirnsberger, Thomas, Knoll, Oliver
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:The teaching relates to a method for plating a recess in a substrate, a device for plating a recess in a substrate and a system for plating a recess in a substrate comprising the device. The method for plating a recess in a substrate includes the following:a) Providing a substrate with a substrate surface comprising at least one recess,b) applying a replacement gas to the recess to replace an amount of ambient gas in the recess to at least partially clear the recess from the ambient gas,c) applying a processing fluid to the recess, wherein the replacement gas dissolves in the processing fluid to at least partially clear the recess from the replacement gas, andd) plating the recess.