ABNORMALITY DETECTING METHOD AND ABNORMALITY DETECTING APPARATUS

An abnormality detecting method includes: generating substrate information that represents a relationship between an in-plane position of a substrate processed in a semiconductor manufacturing apparatus and a film characteristic; and determining whether the film characteristic of the processed subst...

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Bibliographische Detailangaben
1. Verfasser:	NAKASATO, Yuka
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CALCULATING COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS COMPUTING COUNTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS SEMICONDUCTOR DEVICES TESTING
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Zusammenfassung:	An abnormality detecting method includes: generating substrate information that represents a relationship between an in-plane position of a substrate processed in a semiconductor manufacturing apparatus and a film characteristic; and determining whether the film characteristic of the processed substrate is abnormal, based on the substrate information generated in the generating, and association information in which substrate information and abnormality factors are associated with each other.